Logo   Fitting Interface For Reciprocal Electron Beam Lithography Point Spread With Offset 2D
y = a*exp(-b*x) + c*exp(-(x-d)2 / f2) + g*exp(-(x-h)2 / i2) + j*exp(-(x-k)2 / l2)
y = 1.0 / y + Offset
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